Thank you for attending the ICSE-4 conference
We enjoyed meeting everyone who came to the five day conference and were pleased that we had productive discussions about your applications.
In particular, we were delighted to discover the recent advances in ellipsometry presented by knowledgeable members of the ellipsometry community.
We would like to extend a special thank you to all our users who presented their work at the conference.
For additional information please contact:
Great
Success for the 3rd Meeting of the HORIBA Jobin Yvon Ellipsometer User
Club
The annual meeting for the French speaking users of HORIBA Jobin Yvon ellipsometers was held on 18th January 2007.
The day was appreciated by our users allowing us to keep them informed of the continuous improvement of our ellipsometers and DeltaPsi2 software. It also provided the opportunity to listen carefully to their needs and develop relationships with them. It also devoted a significant part to the technique and the practice on various applications, each one benefitting from the experience of each other! This 3rd meeting was particularly based on the topic of workshops organized for the afternoon.
Three workshops were held in parallel:
-
Approaching the analysis of organic and polymeric layers
- The parameter setting of the most common dispersion formulae
- The advanced features of the DeltaPsi2 software
For the third consecutive year, this meeting was a success which included an increase in the number of participants. We hope that 2007 brings even richer collaborations.
For additional information please contact:
Continuing Technical Seminar in Spectroscopic Ellipsometry
A technical seminar in spectroscopic ellipsometry was held in the University of Brno (Czech Republic), the HORIBA Jobin Yvon’s centre of excellence in ellipsometry on the 24th and 25th October.
The conference was conducted over two days:
-
the 1st day provided the opportunity to gain a better understanding of the spectroscopic ellipsometry technique and its applications. In addition, participants presented very diverse, and interesting applications related to in-situ ellipsometry of DLC films, ellipsometric studies of membrane formation and protein-membrane interactions, optical measurements of Si wafer temperature, and modeling of optical constants of solids.
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A sample analysis session was organized the 2nd day. Attendees brought samples that were analyzed using the UVISEL and MM-16 spectroscopic ellipsometers. Hands-on demonstrations are always very appreciated as it allows users to see how the analysis is performed, the possibilities of the technique and give some results of the sample under analysis!
The number of participants and their high level of interest proved that Spectroscopic Ellipsometry is becoming more and more popular to characterize thin film thickness and optical constants simply, accurately and non destructively.
We would like to thank the very good support provided by the University of Brno and the Labimex company, and the HORIBA Jobin Yvon representative in the Czech Republic.
Spectroscopic Ellipsometry Workshop
7th March Driebergen (The Netherlands)
Spectroscopic ellipsometry is a non-destructive optical technique dedicated to the characterization of thin film structures and material properties. It allows the determination of thicknesses from 1Å to tens of µm, optical properties, composition, microstructure, anisotropy…
The workshop is designed to provide attendees with comprehensive and technical information about thin film, surface and interface characterization by spectroscopic ellipsometry. The program will consist of an overview of the theory and methodology of the technique and will bridge research and industrial applications.
We encourage you to bring samples to be measured by the MM-16 spectroscopic ellipsometer.
For more information, please contact:
New Training Course Program for 2007
The HORIBA Jobin Yvon training course program for 2007 is now available!
HORIBA Jobin Yvon provides practical training in:
- Thin Film Characterization by Spectroscopic and Laser Ellipsometry
Click
here to access the details.
Product News
UVISEL DUV: Fastest thin film measurement down to 155 nm
The new UVISEL DUV extends
the UVISEL range of spectroscopic ellipsometers down to 155nm.
Based on the well established phase modulation technology the UVISEL DUV delivers the most accurate and sensitive measurements for the determination of thin film thickness and optical constants.
The UVISEL DUV design achieves unique performance in the DUV. The full spectral range from 155 to 826 nm is measured at a higher speed than any competitor with an excellent signal to noise ratio.
To minimize the affect of the purging on sample throughput, the UVISEL DUV is configured as three separate compartments; the lamp, the monochromator and the sample chamber, each with separate access. It provides high flexibility and versatility for sample handling and experiments, and enables high sample throughput.
DUV spectroscopic ellipsometry applications range from the measurements of the optical constants and optical bandgap of materials absorbing far in the UV such as high k materials, organic materials, stepper optics, photoresists. DUV spectroscopic ellipsometry provides increased sensitivity to very thin layers and interfaces. This is especially useful for nanoscale applications where the characterization of a native oxide, a rough over layer or an interface affects the efficiency of the final device.
For additional information, please contact:
LEM Series: Versatile Laser Interferometric Camera and Endpoint Detector
The
DIGILEM camera family has been released by HORIBA Jobin
Yvon with the new versatile LEM camera series offering a
compact design and enhanced image quality for all types
of samples.
The LEM camera can be mounted on any process chamber with direct top view of the wafer, and provides a real-time digital CCD image of the sample surface making spot positioning simple. Based on the interferometry technique, the camera is ideally suited to etch/deposition rate monitoring and endpoint detection.
Operating at 670 or 905 nm, the LEM camera series is available in three versions:
- Designed for OEMs and laboratory QC the LEM provides a simple analog output of signal intensity that can be treated by any external software.
- The LEM CT includes full computer control and shares the same SIGMA-P platform as all HORIBA Jobin Yvon endpoint tools. It measures in real-time etch or deposition rate, thickness variations and also detects interface. The LEM CT is the perfect tool for OEMs and process development in industrial R&D environments.
- For high volume production the LEM PR is the complete automatic version including automatic spot positioning using Cognex® pattern recognition plus advanced communication capabilities.
For additional information, please contact:
MM-16
Spectroscopic Ellipsometer
The Innovative MM-16 Liquid Crystal Modulation Ellipsometer for
Advanced Thin Film Characterization
HORIBA Jobin Yvon introduces the new MM-16, a competitively priced spectroscopic ellipsometer that extends the capabilities of classical ellipsometry for the characterization of thin film thickness and optical properties with high accuracy and simplicity. The innovative liquid crystal modulation technology used by the MM-16 provides an ellipsometer that is very fast, very accurate, very compact and very simple to operate.
The MM-16 is unique in its ability to collect full spectral ellipsometric data at high resolution and calculate the complete 16-element Mueller Matrix in < 2 seconds. This allows simple characterization of complex birefringent materials, and also simplifies the investigation of samples exhibiting depolarization effects.
These unique capabilities fulfil the requirements for standard thin film metrology as well as many emerging applications using complex materials and structures in the display, biotechnology, packaging and semiconductor areas.
The MM-16 is controlled from the DeltaPsi2 integrated software package to provide turnkey operation for a wide range of industrial and research applications.
UVISEL
VIP
Film Thickness Measurement with High Spatial Resolution for Patterned
and Multilayer Materials
HORIBA Jobin Yvon has extended the performance capability of the UVISEL spectroscopic phase modulated ellipsometer with the integration of the VIP DUV Spectroscopic reflectometer. The combination of high precision ellipsometer and reflectometer measuring at the same sample position allows characterization of features as small as 10 microns.
