In-Situ
Spectroscopic Thin Film Processing
- Accurate thickness and optical constants monitoring
- Easy to mount onto a process chamber
- Simple to operate
- Simple integration into the HORIBA Jobin Yvon multi-sensor platform
Because the MM-16 spectroscopic ellipsometer uses CCD detection, it is very well adapted to in-situ process monitoring and control applications.
The MM-16 in-situ spectroscopic ellipsometer ensures accurate real-time calculation of the thickness and optical constants of deposited or etched layers.
The compact ellipsometric heads are easily mounted onto CVD, electron-beam, MBE, sputtering as well as any other chamber that has an entrance and exit window for the measuring beam.
The MM-16 in-situ spectroscopic ellipsometer is simple to operate and adaptable to many types of processes, for demanding research and industrial quality control applications.
In-situ
real-time control and monitoring of: |
Due to its very high sensitivity in-situ ellipsometry is ideal for investigating any change in surface properties, such as oxide formation, chemisorption, surface contamination or protein adsorption very accurately, in real-time. |
